XPS studies of the films formed
on the Ti-Cu(2%) alloy in 5M phosphoric acid
M. Khadiri1, M. Elyaagoubi2, A. Elmansouri2, A. Benyaïch1, A. Outzourhit2*
1Laboratoire d’Electrochimie et de Chimie analytique
2Laboratoire de Physique du Solide et des Couches Minces
Université cadi ayyad, faculté des Sciences Semlalia Marrakech 40.000 B. P 2390, MAROC.
* Corresponding author. E-mail: firstname.lastname@example.org
Received: 23 July 2013; revised version accepted: 28 December 2013
The surface of Ti-Cu(2%) samples subjected to different treatments in 5M phosphoric acid has been studied. In all cases, no peak characteristics of TiO2 were observed by X-ray diffraction for the three studied samples, suggesting the amorphous nature of the formed films. In addition, XPS measurements revealed that the oxidation state of titanium on the Ti-Cu(2%) surfaces is mixture of the Ti3+ and Ti4+ valences, when the latter is subjected to potential sweep. Under potentiostatic conditions, the formed film consists of a highly hydrated titanium; oxide (TiO2) with a small contribution of oxidation state lower than +4. At high voltages range (between 15 and 30 V), a highly hydrated TiO2 film is obtained
Keywords: Ti-Cu; TiO2; XPS; Anodization.