Characterization of In-doped and Ga-doped zinc oxide film deposited by spray pyrolysis

 

A. Hadri1, C. Nassiri1, F.Z. Chafi1, M. Loghmarti1, M. Tricha2, A. Mzerd1*

1University Mohammed V-Agdal, Faculty of Sciences, Physics Department, LPM, B.P. 1014, Rabat, Morocco

2Hopital Mohammed V d’instruction Militaire. Rabat, Morocco.

* Corresponding author. E-mail: mzerd@yahoo.fr

Received: 27 October 2014; revised version accepted: 03 January 2015

 

Abstract

     Zinc oxide thin films doped with group III elements (In, Ga) are deposited on glass substrates at350 °C by spray pyrolysis technique. X-ray diffraction patterns show that both undoped and doped films exhibit the hexagonal Wurtzite crystal structure with a preferential orientation along [002] direction, with a shift of (002) peak after group III doping. No additional peak corresponding to secondary phases is observed within the detection limit of the XRD technique. The Energy-Dispersive X-ray spectroscopy results confirmed the presence of In and Ga elements in the doped films. All films present a high transmittance in the visible range with a constant absorption edge. The lowest electrical resistivity is found in the Ga doped zinc oxide.

 

Keywords: ZnO; IZO; GZO; Spray pyrolysis; Thin films; Hall Effect.

 


 

© 2015